High Power Laser Mirrors for Nanosecond Applications
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High Power Laser Mirrors for Nanosecond Applications SKU: 045-0350UHHR-i0

New ultra high damage threshold laser mirrors are designed for applications with femtosecond lasers. These mirrors are produced using advanced IBS coating technology. Mirrors design wavelengths include fundamental Nd:YAG laser 1064 nm, its frequency-doubled 532 nm and 800 nm…

Variant specifications

Specification Value
Wavelength 355 nm
Material UV FS
Size ø50.8 x 12 mm
AOI
LIDT >10 J/cm²
R, % (s+p)/2 99.8%

Shared product specifications

These specifications apply across the High Power Laser Mirrors for Nanosecond Applications product family.

Substrate

Material UV grade fused silica
S1 Surface flatness λ / 10 at 633 nm
S1 Surface quality 20-10 scratch&dig (MIL-PRF-13830B)
S2 Surface quality Commercial polish
Diameter tolerance +0.00 mm / -0.12 mm
Thickness tolerance ±0.25 mm
Wedge < 3 min
Chamfer 0.3 mm at 45° typical

Coating

Technology Ion Beam Sputtering (IBS)
Adhesion and Durability Per MIL-C-675A, Insoluble in lab solvents
Clear apterture Exceeds 85% of diameter
Coated surface flatness λ / 8 at 633 nm over 80% of diameter
Laser Induced Damage Threshold Measured at design wavelength, 10 ns pulse, 100 Hz

Classification

Wavelength 1064nm

Variant files

Technical drawings, models and data files for SKU 045-0350UHHR-i0.

Product brochures

Shared documentation for the complete product family.